RAVE N.P., INC.

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
B08B CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL 1147
 
  
 
B24C ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL612
 
  
 
B05B SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES 361
 
  
 
B24B MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING 264
 
  
 
F25J LIQUEFACTION, SOLIDIFICATION, OR SEPARATION OF GASES OR GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT 227
 
  
 
G01N INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES 2204
 
  
 
B01D SEPARATION 1133
 
  
 
F16K VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING172
 
  
 
G02B OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS 1204
 
  
 
G03C PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES 145

Top Patents (by citation)

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Recent Publications

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9822903 Smart valveFeb 25, 14Nov 21, 17[F16K, G01R]
8801504 nozzlesMay 03, 13Aug 12, 14[B24C]
8568018 Fluid injection assembly for nozzlesDec 15, 08Oct 29, 13[B05B]
8454409 nozzlesSep 10, 09Jun 04, 13[B24B, B24C]
7564625 Systems and methods for a scanning boom microscopeJan 20, 06Jul 21, 09[G02B]
7056391 Liquid-assisted cryogenic cleaningJul 07, 04Jun 06, 06[B08B]
6949145 Vapor-assisted cryogenic cleaningMar 31, 03Sep 27, 05[B08B]
6852173 Liquid-assisted cryogenic cleaningDec 19, 02Feb 08, 05[B08B]
6500758 Method for selective metal film layer removal using carbon dioxide jet spraySep 12, 00Dec 31, 02[H01L]
6405560 Apparatus for analysis of impurities in liquid carbon dioxideJun 22, 01Jun 18, 02[F25J]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2012/0279,519 Integrated Substrate Cleaning System and MethodAbandonedOct 28, 11Nov 08, 12[B08B]
2009/0126,760 SYSTEM FOR CLEANING A SURFACE USING CROGENIC AEROSOL AND FLUID REACTANTAbandonedApr 19, 05May 21, 09[B08B]
2009/0107,526 CO2 SYSTEM FOR POLYMER FILM CLEANINGAbandonedOct 30, 08Apr 30, 09[B08B]
6845145 Method of improving x-ray lithography in the sub 100nm range to create high quality semiconductor devicesExpiredJun 07, 01Jan 18, 05[G21K]
6295332 Method of improving x-ray lithography in the sub 100nm range to create high quality semiconductor devicesExpiredJun 12, 99Sep 25, 01[G21K]
5172190 Alignment patterns for two objects to be aligned relative to each otherExpiredJan 11, 91Dec 15, 92[G01B]

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